A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH₃)₂Cl]₂

• Elif Bilgilisoy,
• Ali Kamali,
• Thomas Xaver Gentner,
• Gerd Ballmann,
• Sjoerd Harder,
• Hans-Peter Steinrück,
• Hubertus Marbach and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

• , which in turn is critical to the resulting purity of the FEBID deposits. In general, electron-induced fragmentation processes are categorized as dissociative ionization (DI), dissociative electron attachment (DEA), dipolar dissociation (DD), and neutral dissociation (ND) [25]. To fully comprehend the

Low-energy electron interaction and focused electron beam-induced deposition of molybdenum hexacarbonyl (Mo(CO)₆)

• Po-Yuan Shih,
• Maicol Cipriani,
• Christian Felix Hermanns,
• Jens Oster,
• Klaus Edinger,
• Armin Gölzhäuser and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2022, 13, 182–191, doi:10.3762/bjnano.13.13

• ]. In general, there are four distinct electron-induced processes that lead to molecular fragmentation [13]. These are dissociative electron attachment (DEA), dissociative ionization (DI), neutral dissociation (ND) and dipolar dissociation (DD). The processes differ distinctly in their energy dependence

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• by four distinctly different processes, which are active within different energy ranges, and more importantly, lead to distinctly different processes; dissociative electron attachment (DEA), dissociative ionization (DI), and neutral and dipolar dissociation upon electron excitation (ND and DD). An

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

• Leo Sala,
• Iwona B. Szymańska,
• Céline Dablemont,
• Anne Lafosse and
• Lionel Amiaud

Beilstein J. Nanotechnol. 2018, 9, 57–65, doi:10.3762/bjnano.9.8

• efficient process is neutral dissociation (ND), which produces two neutral fragments. It is in competition with dipolar dissociation (DD), which produces two ions of opposite charges that can be further neutralized. In the low-energy range, below the two previously mentioned thresholds, the only efficient

Synthesis of [{AgO₂CCH₂OMe(PPh₃)}_n] and theoretical study of its use in focused electron beam induced deposition

• Jelena Tamuliene,
• Julian Noll,
• Peter Frenzel,
• Tobias Rüffer,
• Alexander Jakob,
• Bernhard Walfort and
• Heinrich Lang

Beilstein J. Nanotechnol. 2017, 8, 2615–2624, doi:10.3762/bjnano.8.262

• ≈50. The reactions of a dissociative ionization, dipolar dissociation, dissociative electron attachment etc. were studied to obtain the reaction pathways energetically most likely and relate to experimentally obtained species. It implies that the energetic of reactions leading from the intact neutral

Amplified cross-linking efficiency of self-assembled monolayers through targeted dissociative electron attachment for the production of carbon nanomembranes

• Sascha Koch,
• Christopher D. Kaiser,
• Paul Penner,
• Michael Barclay,
• Lena Frommeyer,
• Daniel Emmrich,
• Patrick Stohmann,
• Tarek Abu-Husein,
• Andreas Terfort,
• D. Howard Fairbrother,
• Oddur Ingólfsson and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2017, 8, 2562–2571, doi:10.3762/bjnano.8.256

• ]. In the energy range from about 0–100 eV, electron-induced bond rupture may proceed through four distinctly different initiating processes: dissociative ionization (DI), neutral or dipolar dissociation upon electronic excitation (ND and DD, respectively) or through dissociative electron attachment

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

• Ragesh Kumar T P,
• Sangeetha Hari,
• Krishna K Damodaran,
• Oddur Ingólfsson and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2017, 8, 2376–2388, doi:10.3762/bjnano.8.237

•  1), dissociative ionization (DI; Equation 2), neutral dissociation (ND; Equation 3) and dipolar dissociation (DD; Equation 4) [13][14][15][16][17][18][19][20]. The respective reaction schemes for each of these pathways are: The double dagger (‡) signifies vibrational or electronic excitation, the

Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl

• Janina Kopyra,
• Paulina Maciejewska and
• Jelena Maljković

Beilstein J. Nanotechnol. 2017, 8, 2257–2263, doi:10.3762/bjnano.8.225

• molecules via various decomposition processes such as dissociative ionization (DI), dipolar dissociation (DD), neutral dissociation (ND), and dissociative electron attachment (DEA) [8]. These reactions occur with relatively high cross sections and typically result in partial fragmentation of the precursor

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

• FEBID, specifically, dissociative electron attachment, dissociative ionization, neutral dissociation, and dipolar dissociation, emphasizing the different nature and energy dependence of each process. We then explore the value of studying these processes through comparative gas phase and surface studies

• are needed, these studies are an important stepping-stone toward better understanding the fundamental physics behind the deposition process and establishing design criteria for optimized FEBID precursors. Keywords: dipolar dissociation; dissociative electron attachment; dissociative ionization

• such as Pt(PF3)4 [13][14], MeCpPtMe3 [15], W(CO)6 [16][17], Cu(hfac)2 and Pd(hfac)2 [18], Co(CO)3NO [10] and Fe(CO)5 [19]. These processes, which are comprised of DEA, DI, ND, and dipolar dissociation (DD), cannot be distinguished in FEBID or surface experiments with high-energy PE beams, where the